MQW devices and methods for semiconductor patterning systems

ABSTRACT

MQW devices, IC chips and methods may be used in semiconductor lithography patterning systems. An MQW device includes an array of pixels that have transmission elements and associated support circuits. The support circuits have preliminary memory cells and final memory cells. The final memory cells store transmittance values that control transmittances of the associated transmission elements. This way, exposure of a target with a lithography system for purposes of patterning the target may be performed through the transmission elements according to the controlled transmittances, while subsequent transmittance values are being received by the preliminary memory cells from memory banks. The exposure of the target therefore needs to pause for less time, in order to wait for the MQW device to be refreshed with the subsequent transmittance values. Accordingly the whole semiconductor lithography patterning system may operate faster and thus have more throughput.

CROSS REFERENCE TO RELATED PATENT APPLICATIONS

This application is divisional patent application of U.S. patentapplication Ser. No. 14/714,245, filed May 15, 2015, which claimspriority from U.S. Provisional Patent Application Ser. No. 62/089,173,filed on Dec. 8, 2014, the disclosure of which is hereby incorporated byreference.

BRIEF SUMMARY

The present description gives instances of Multiple-Quantum-Well (MQW)devices, IC chips and methods that may be used in semiconductorlithography patterning systems, the use of which may help overcomeproblems and limitations of the prior art.

In embodiments, an MQW device includes an array of pixels that havetransmission elements and associated support circuits. The supportcircuits have respective preliminary memory cells and final memorycells. The final memory cells store transmittance values that controltransmittances of the associated transmission elements. This way,exposure of a target with a lithography system for purposes ofpatterning the target may be performed through the transmission elementsaccording to the controlled transmittances, while subsequenttransmittance values are being received by the preliminary memory cellsfrom memory banks.

An advantage over the prior art arises from the fact that the exposureof the target needs to pause for less time, in order to wait for the MQWdevice to be refreshed with the subsequent transmittance values.Accordingly the whole semiconductor lithography patterning system mayoperate faster and thus have more throughput.

These and other features and advantages of this description will becomemore readily apparent from the Detailed Description, which proceeds withreference to the associated drawings in which:

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A is a diagram of a semiconductor patterning system using a sampleMQW device made according to embodiments.

FIG. 1B largely repeats the diagram of FIG. 1A, and further showssalient details of the sample MQW device made according to embodiments.

FIG. 1C is a diagram that repeats elements of FIG. 1B, while showing inmore detail a first support circuit of the MQW device of FIG. 1Baccording to embodiments.

FIG. 2 is a diagram of a FET that can be used as a preliminary switch inthe support circuit of FIG. 1C according to embodiments.

FIG. 3 is a schematic diagram of a preliminary memory cell in thesupport circuit of FIG. 1C according to embodiments.

FIG. 4 is a diagram of a capacitor that can be used as a preliminarymemory cell in the support circuit of FIG. 1C according to embodiments.

FIG. 5 is a diagram of a FET that can be used as a load switch in thesupport of FIG. 1C according to embodiments.

FIG. 6 is a schematic diagram of a final memory cell in the supportcircuit of FIG. 1C according to embodiments.

FIG. 7A is a schematic diagram of a sample embodiment of the supportcircuit of FIG. 1C.

FIG. 7B is a timing diagram of signals that can be used in the circuitof FIG. 7A.

FIG. 8A is a schematic diagram of another sample embodiment of thesupport circuit of FIG. 1C.

FIG. 8B is a timing diagram of signals that can be used in the circuitof FIG. 8A.

FIG. 9A is a schematic diagram of one more sample embodiment of thesupport circuit of FIG. 1C.

FIG. 9B is a timing diagram of signals that can be used in the circuitof FIG. 9A.

FIG. 10 is a block diagram of a sample MQW array system that includes anMQW device according to embodiments.

FIG. 11 is a block diagram of a sample architecture according toembodiments.

FIG. 12 is a flowchart for illustrating methods according toembodiments.

DETAILED DESCRIPTION

As has been mentioned, the present description is about components andmethods that may be used in semiconductor patterning systems.Embodiments are now described in more detail.

FIG. 1A is a diagram of a semiconductor patterning system 100, which isalso known as a lithography system 100. System 100 is intended topattern a target 110, so as to turn it into a useful device. Target 110can be made of semiconductor materials. System 100 includes a source 160that is configured to transmit a beam 170 of energy. The energy of beam170 can be ions, optical energy, and so on, and may ultimately patterntarget 110.

System 100 also includes a memory bank 120 and a data line 125 coupledto memory bank 120. Memory bank 120 is configured to store data thatincludes pre-calculated transmittance values, such as a firsttransmittance value TV1 121 and a second transmittance value TV2 122.These transmittance values will ultimately determine how target 110 ispatterned.

System 100 further includes a Multiple-Quantum-Well (MQW) device 130that is made according to embodiments, and is configured for use insystem 100. MQW device 130 may include pixels that are made according toembodiments, and are arranged in a two-dimensional array of rows andcolumns. FIG. 1A shows only two pixels, namely pixel A 131 and pixel B132. Pixels 131, 132 are in the same row. The pixels of MQW device 130are actually optical elements that operate in transmission. Theseoptical elements can be smart optical elements, whose transmissiondepends on the transmittance values stored in memory bank 120. Forexample, when a transmittance value that is stored in memory bank 120has been brought from to pixel A 131, the optical element may permittransmission or not depending on whether the transmittance value is 0or 1. The MQW device 130 can be a Self-Electro Optic Effect (SEED)device. Some MQW devices that are made from GaAs/AlGaAs can be designedfor operation at 850 nm.

Source 160 is configured to transmit beam 170 towards MQW device 130,along a direction 161. Since beam 170 passes through the pixels thatpermit transmission, multiple beamlets of transmitted beam 170 emergefrom MQW device 130, and reach and pattern target 110. In the example ofFIG. 1A only two such beamlets 171, 172 are shown. Target 110 ispatterned because some of its locations receive beamlets and othersdon't.

In system 100, the pre-calculated transmittance values are transferredfrom memory bank 120 via data line 125 at a high rate, and loaded to thepixels so as to control how much power they individually permit to betransmitted. Then beam 170 is transmitted while a frame of thesetransmittance values is loaded onto the pixels. In embodiments, target110 is moveable within system 100, and in fact progresses through aseries of positions so that multiple locations of its surface arepatterned. Beamlets 171, 172 can be repeated when target 110 has movedto the next such position, with different transmittance values loaded inthe pixels.

A challenge in the prior art is that a blackout period for beam 170 mayneed to be maintained after an exposure session of illuminating withbeam 170, and while a new frame of transmittance values is being loadedfrom memory bank 120. The blackout period limits how fast target 110 maybe moved through system 100, and therefore the overall speed andthroughput of system 100.

Embodiments of pixels of MQW device 130, such as pixels 131, 132, can bestructured such that they permit refreshing by loading transmittancevalues for a new frame in a manner that can reduce the blackout period.The blackout period may become even shorter than the time needed fortarget 110 to move to the next position, in which case the blackoutperiod ceases to be a limitation to the throughput of system 100. Insome embodiments, the blackout period may even be eliminated completely.Embodiments are now described in more detail.

FIG. 1B largely repeats the diagram of FIG. 1A. A difference is thatpixels 131, 132 are shown in more detail, and with their componentsartificially rearranged to facilitate aspects of this description. Moreparticularly, first pixel A 131 includes a first transmission element151 and a first support circuit A 141. And second pixel B 132 includes asecond transmission element 152 and a second support circuit B 142.

First support circuit 141 can be configured to receive firsttransmittance value TV1 121 via data line 125. As will be seen later,first support circuit 141 can also be configured to store the receivedfirst transmittance value TV1 121, and a transmittance of firsttransmission element 151 depends on first transmittance value TV1 121that is stored in first support circuit A 141.

Second support circuit 142 can be configured to receive via data line125 and store second transmittance value TV2 122. A transmittance ofsecond transmission element 152 depends on second transmittance valueTV2 122 that is stored in second support circuit B 142. In someembodiments, as will be seen later, second support circuit 142 receivessecond transmittance value TV2 122 via first support circuit 141,although this is not required.

Transmission elements 151, 152 are part of a group 150 of transmissionelements. Group 150 can be generally in the path of beam 170 as it comesalong direction 161. As seen above, their transmittances depend on thestored first and second transmittance values TV1 121, TV2 122.Accordingly, transmission elements 151, 152 permit to emerge throughthem, according to their transmittances, beamlets 171, 172 oftransmitted beam 170 that reaches MQW device 130. Indeed, beamlets 171,172 are shown emanating from transmission elements 151, 152respectively, in better detail than in FIG. 1A.

In embodiments, the support circuits of the pixels of MQW device 130 usedual memory cells. A final memory cell is used to store the currentvalue for a pixel, and a preliminary memory cell is used to store thenext value. This may shorten or practically eliminate the blackoutperiod. Embodiments are now described in more detail.

FIG. 1C is a diagram that repeats elements of FIG. 1B, while showingfirst support circuit A 141 in more detail. As before, data line 125delivers transmission values TV1 121, TV2, 122 to first support circuitA 141 and second support circuit 142 respectively. Data line 125 is notshown within first support circuit A 141, but is interrupted by it. Aswill be seen, before reaching second support circuit 142, in someembodiments data line 125 includes components of first support circuit A141, while in other embodiments data line 125 bypasses all components offirst support circuit A 141.

First support circuit A 141 includes a first preliminary memory cell A144 that is configured to store the received first transmittance valueTV1 121. First support circuit A 141 also includes a first load switch A146, and a first final memory cell A 148. First final memory cell A 148has a first data node 149. First final memory cell A 148 can beconfigured to receive first transmittance value TV1 121 from firstpreliminary memory cell A 144 through first load switch A 146, and storethe received first transmittance value TV1 121. Accordingly, atransmittance of first transmission element 151 may depend on firsttransmittance value TV1 121 that is stored in first final memory cell A148.

In the example of FIG. 1C, the dual memory cells are first preliminarymemory cell A 144 and first final memory cell A 148. In embodiments,then, first preliminary memory cell A 144 is further configured toreceive via data line 125 a subsequent transmittance value. Firstpreliminary memory cell A 144 can be further configured to store thereceived subsequent transmittance value, concurrently with first finalmemory cell A 148 storing first transmittance value TV1 121. First finalmemory cell A 148 can be configured to then store the subsequenttransmittance value.

In some embodiments, first support circuit A 141 further includes afirst preliminary switch A 143. In such embodiments, first transmittancevalue TV1 121 can be received via data line 125 by first preliminarymemory cell A 144 through first preliminary switch A 143. Firstpreliminary switch A 143 can be used in serial embodiments to isolatefirst preliminary memory cell A 144 from data line 125 whentransmittance values are transported for other pixels. In suchembodiments, first transmittance value TV1 121 can be configured to bereceived through first preliminary switch A 143 responsive to a columnsignal.

There is a number of ways in which the components of first supportcircuit A 141 may be implemented. Briefly, the switches can be madeusing (Field Effect Transistors) (“FET”s), and the memory cells can bemade using SRAM or DRAM cells. Examples are now described.

FIG. 2 is a diagram of a FET 243. First preliminary switch A 143 mayinclude FET 243, which opens responsive to column signal COL.

FIG. 3 is a schematic diagram of a preliminary memory cell 344.Preliminary memory cell 344 can be first preliminary memory cell A 144,which includes two inverters 301, 302. For output stability, inverter301 can be strong while inverter 302 can be weak. This can beaccomplished in a number of ways. For example, inverters 301, 302 can beoperated at different supply voltages. Inverter 301 could have a lowerinversion voltage. In embodiments, inverter 302 is a tri-state inverter,capable of assuming a high output-impedance state depending on a signalS2. Of course, when an inverter is used, it is possible that firstpreliminary memory cell A 144 is configured to store a negative versionof first transmittance value TV1 121.

FIG. 4 is a diagram of a capacitor 444. First preliminary memory cell A144 may include a capacitor such as capacitor 444—this would be a DRAMimplementation.

FIG. 5 is a diagram of a FET 546. First load switch A 146 may includeFET 546.

In some embodiments, the first transmittance value is configured to bereceived through the first load switch responsive to a load signal LOAD.FIG. 5 shows how such a load signal may be received.

FIG. 6 is a schematic diagram of a final memory cell 648, which includesa first data node 649. Final memory cell 648 can be used for first finalmemory cell A 148. First final memory cell A 648 includes two inverters603, 604. For output stability, inverter 603 can be strong whileinverter 604 can be weak. In embodiments, inverter 604 is a tri-stateinverter, capable of assuming a high output-impedance state depending ona signal S3. Again, when an inverter is used, it is possible that firstfinal memory cell A 148 is configured to store a negative version offirst transmittance value TV1 121, so appropriate planning may beconducted. Inverters 603, 604 can be coupled between first data node 649and a first inverting node 647. A transmittance of first transmissionelement 151 may depend on first transmittance value TV1 121 stored infirst inverting node 647.

Examples are now described of particular embodiments of first supportcircuit A 141. It will be recognized that these examples includeingredients described in FIGS. 2-6.

FIG. 7A is a schematic diagram of a support circuit 741 that could befirst support circuit A 141. Support circuit 741 receives data from dataline 725, which can be data line 125. Support circuit 741 includes a FET743 that functions as the first preliminary switch, and a pair ofinverters 701, 702 that function as the first preliminary memory cell,responding to a column signal COL. Inverter 702 may receive thecomplementary COL signal (COL_BAR or /COL). Support circuit 741additionally includes a FET 746 that functions as the first load switch,and a pair of inverters 703, 704 that function as the final memory cell.Inverters 703, 704 are coupled between a first data node 749 and a firstinverting node 747. Inverter 704 may receive the complementary loadcommand LOAD_BAR.

FIG. 7B is a timing diagram of signals that can be used in the circuitof FIG. 7A. The data may be input in any order, as long as the columnselect signal matches the data order.

FIG. 8A is a schematic diagram of a support circuit 841 that could befirst support circuit A 141. Support circuit 841 receives data from dataline 825, which can be data line 125. Support circuit 841 includes a FET843 that functions as the first preliminary switch, and a capacitor 844that functions as the first preliminary memory cell. FET 843 may respondto a column signal COL. Support circuit 841 additionally includes a FET846 that functions as the first load switch, and a pair of inverters803, 804 that function as the final memory cell. Inverters 803, 804 arecoupled between a first data node 849 and a first inverting node 847.FET 846 may respond to a load command LOAD, while inverter 804 mayreceive the complementary load command LOAD_BAR.

FIG. 8B is a timing diagram of signals that can be used in the circuitof FIG. 8A. The data may be input in any order, as long as the columnselect signal matches the data order.

FIG. 9A is a schematic diagram of a support circuit 941 that could befirst support circuit A 141. Support circuit 941 receives data DATA(i)from data line 925, which can be data line 125. Support circuit 941includes a FET 943 that functions as the first preliminary switch, and apair of inverters 901, 902 that function as a first preliminary memorycell 944. FET 943 may respond to a write signal WR(i), while inverter902 may receive the complementary write signal WR(i)_BAR. Supportcircuit 941 additionally includes a FET 946 that functions as the firstload switch, and a pair of inverters 903, 904 that function as the finalmemory cell. Inverters 903, 904 are coupled between a first data node949 and a first inverting node 947. FET 946 may respond to a loadcommand LOAD, while inverter 904 may receive the complementary loadcommand LOAD_BAR.

FIG. 9A is an example of an embodiment where data line 925 includes acomponent of a support circuit, namely first preliminary memory cell944. While transmittance value DATA(i) may be received in its positiveversion, the transmittance value DATA(i+1) for the next pixel may bereceived inverted, i.e. a complementary or negative version may bereceived. In that case, an additional inverter may be needed for thesupport circuit of every second pixel, or the even numbered columns, andtherefore the support circuits might not be all the same.

FIG. 9B is a timing diagram of signals that can be used in the circuitof FIG. 9A. Data is shifted in from column 0 to column n. In thisexample it is assumed that n is odd. It should be observed thatalternate data is served in its complementary form.

Whether the additional inverter is provided or not, the other supportcircuits such as second support circuit B 142 can have largely similarcomponents. For example, second support circuit B 142 may include asecond preliminary memory cell configured to store the received secondtransmittance value, a second load switch, and a second final memorycell. The second final memory cell can be configured to receive thesecond transmittance value from the second preliminary memory cellthrough the second load switch. In such cases, the second supportcircuit can be configured to store the second transmittance value in thesecond final memory cell.

In many embodiments, a single load signal is used for many or all thepixels. For example, the first final memory cell can be configured toreceive the first transmittance value responsive to a load signal, andthe second final memory cell can be configured to receive the secondtransmittance value responsive to the same load signal. Accordingly, thefinal memory cells can be refreshed with new values simultaneously atthe rising edge of the LOAD command.

The embodiments mentioned above may be provided on an Integrated Circuit(IC) chip. Such an IC chip may include a substrate, and a MQW device maybe provided on the substrate. Source 160 would transmit beam 170 towardsthe IC chip, and the transmitted beam is aimed towards the MQW device.Such an IC chip may further include additional components for an MQWarray system. An example is now described.

FIG. 10 is a block diagram of an MQW array system 1001 according toembodiments, which includes a MQW device 1030 that can be made asdescribed above. System 1001 includes a digital block 1002 that inputs arefresh signal, and one or more Phase Locked Loops 1004 forsynchronization. Generally, data is received along the horizontaldirection, and addressing the pixels is performed along the verticaldirection.

Along the horizontal direction, system 1001 includes a serial interfacearray 1022, a SERDES array 1082, a decoder and FIFO 1024, and levelshifters 1027 feeding data in MQW device 1030. Serial interface array1022 may include multiple high speed serial data and clock ports forspeed, i.e. high frame rate. Serial interface array 1022 may receivedata over M rows across a serial link plus a serial clock. SERDES array1082 may include multiple SERDES units to deserialize data and retimethem. Decoder and FIFO 1024 may perform 10b/8b decoding so as to lowerthe bit error rate (BER), while the FIFO (First In First Out) may adjustdata speed.

Along the vertical direction, a column decoder 1014 may enable columnsof MQW device 130 for writing, for example by originating the COLsignal. Level shifters and drivers 1007 may convert low voltage signalto high voltage (e.g. 10V). In addition, a unit 1017 may provide theload signal (LOAD) and its complement (/LOAD).

The embodiments mentioned above may achieve high speed and low bit errorrate (BER) with low power.

FIG. 11 is a block diagram of an architecture 1100. A CPU/Controller1104 may first calculate the desired mask pattern for one full scan of atarget, and then load into external memory banks 1120 the transmittancevalues. For example, there can be a total 25M frames per scan, and therequired capacity for external memory banks 1120 may thus be 5.184 TB.

After the transmittance values are loaded, external memory banks 1120can be read, and their data can be sent to MQW array system 1101, whichcan be as described in FIG. 10. In the process, the data can be passedby encoder 1180 that may do 8b/10b encoding, and then through aSerializer-Deserializer (SERDES) 1182 to convert serial data toparallel.

FIG. 12 shows a flowchart 1200 for describing methods according toembodiments. The methods of flowchart 1200 may also be practiced byembodiments described above, such as where an MQW device is used.

According to an operation 1210, a first transmittance value is receivedin a first support circuit via a data line. In embodiments where thefirst support circuit also has a first preliminary switch, the firsttransmittance value can be so received through the first preliminaryswitch. Receiving may be performed through the first preliminary switchresponsive to a column signal.

According to another operation 1220, the received first transmittancevalue is stored in the first preliminary memory cell.

According to another operation 1230, the first transmittance value isreceived in the first final memory cell from the first preliminarymemory cell, through the first load switch.

According to another operation 1240, the first transmittance valuereceived at operation 1230 may be stored in a first final memory cell.In such embodiments, a transmittance of a first transmission element maydepend on the first transmittance value stored in the first final memorycell.

According to another operation 1250, a second transmittance value can bereceived in a second support circuit, for example via a data line.

According to another operation 1260, the second transmittance valuereceived at operation 1250 is stored in the second support circuit. Insuch embodiments, a transmittance of a second transmission element maydepend on the second transmittance value stored in the second supportcircuit.

In such embodiments, the first and the second transmission elements maypermit to emerge, according to their transmittances, beamlets of atransmitted beam that reaches an MQW device, and the beamlets emergingfrom the MQW device may reach and pattern a target.

The process may be repeated. For example, a subsequent transmittancevalue may be received in the first preliminary memory cell, via the dataline. The received subsequent transmittance value may be stored in thefirst preliminary memory cell, concurrently with the first final memorycell storing the first transmittance value. The subsequent transmittancevalue may then be received and stored in the first final memory cell.All the variations mentioned above with reference to the circuits andsystems may also apply with reference to the methods of flowchart 1200.

In the methods described above, each operation can be performed as anaffirmative step of doing, or causing to happen, what is written thatcan take place. Such doing or causing to happen can be by the wholesystem or device, or just one or more components of it. In addition, theorder of operations is not constrained to what is shown, and differentorders may be possible according to different embodiments. Moreover, incertain embodiments, new operations may be added, or individualoperations may be modified or deleted. The added operations can be, forexample, from what is mentioned while primarily describing a differentsystem, apparatus, device or method.

A person skilled in the art will be able to practice the presentinvention in view of this description, which is to be taken as a whole.Details have been included to provide a thorough understanding. In otherinstances, well-known aspects have not been described, in order to notobscure unnecessarily the present invention. Plus, any reference to anyprior art in this description is not, and should not be taken as, anacknowledgement or any form of suggestion that this prior art formsparts of the common general knowledge in any country.

This description includes one or more examples, but that does not limithow the invention may be practiced. Indeed, examples or embodiments ofthe invention may be practiced according to what is described, or yetdifferently, and also in conjunction with other present or futuretechnologies. Other embodiments include combinations andsub-combinations of features described herein, including for example,embodiments that are equivalent to: providing or applying a feature in adifferent order than in a described embodiment; extracting an individualfeature from one embodiment and inserting such feature into anotherembodiment; removing one or more features from an embodiment; or bothremoving a feature from an embodiment and adding a feature extractedfrom another embodiment, while providing the features incorporated insuch combinations and sub-combinations.

In this document, the phrases “constructed to” and/or “configured to”denote one or more actual states of construction and/or configurationthat is fundamentally tied to physical characteristics of the element orfeature preceding these phrases and, as such, reach well beyond merelydescribing an intended use. Any such elements or features can beimplemented in any number of ways, as will be apparent to a personskilled in the art after reviewing the present disclosure, beyond anyexamples shown in this document.

The following claims define certain combinations and subcombinations ofelements, features and steps or operations, which are regarded as noveland non-obvious. Additional claims for other such combinations andsubcombinations may be presented in this or a related document.

The invention claimed is:
 1. A method to pattern a target using amultiple-quantum-well (MQW) device configured for use in a semiconductorpatterning system, the method comprising: receiving at a firstpreliminary memory cell of a first pixel a first transmittance valuefrom a memory bank of the semiconductor patterning system via a dataline, the first pixel including a first transmission element and a firstsupport circuit, the first support circuit including the firstpreliminary memory cell, a first load switch, and a first final memorycell; receiving the first transmittance value at the first final memorycell from the first preliminary memory cell via the first load switch;storing the first transmittance value in the first final memory cell;receiving at a second preliminary memory cell of a second pixel a secondtransmittance value from the memory bank of the semiconductor patterningsystem via the data line, the second pixel including a secondtransmission element and a second support circuit, the second supportcircuit including the second preliminary memory cell, a second loadswitch, and a second final memory cell; receiving the secondtransmittance value at the second final memory cell from the secondpreliminary memory cell via the second load switch; storing the secondtransmittance value in the second final memory cell; passing, based onthe first stored transmittance value and the second stored transmittancevalue, a beam of energy through the first and second transmissionelements, as a first beamlet of energy emerging from the firsttransmission element towards the target at a first position and as asecond beamlet of energy emerging from the second transmission elementtowards the target to pattern the target; and blocking, based on achange of the first stored transmittance value, the beam of energy atthe first transmission element, wherein the target includes asemiconductor material.
 2. The method of claim 1, wherein the firstsupport circuit further includes a first preliminary switch, whereinreceiving the first transmittance value further comprises receiving thefirst transmittance value at the first preliminary memory cell throughthe first preliminary switch.
 3. The method of claim 2, whereinreceiving the first transmittance value further comprises receiving thefirst transmittance value in response to a column signal coupled to theMQW device.
 4. The method of claim 1, wherein the first preliminarymemory cell comprises two inverters, and wherein the first final memorycell comprises two inverters.
 5. The method of claim 1, wherein thefirst preliminary memory cell is configured to store a negative versionof the first transmittance value, wherein receiving the firsttransmittance value further comprises storing the negative version ofthe first transmittance value in the first preliminary memory cell,wherein the first final memory cell is configured to store a negativeversion of the first transmittance value, and wherein storing the firsttransmittance value in the first final memory cell further comprisesstoring the negative version of the first transmittance value in thefirst final memory cell.
 6. The method of claim 1, wherein receiving thefirst transmittance value at the first final memory cell comprisesreceiving the first transmittance value at the first final memory cellin response to a load signal.
 7. The method of claim 1, wherein thefirst final memory cell comprises two inverters.
 8. The method of claim1, wherein receiving the first transmittance value at the first finalmemory cell comprises receiving the first transmittance value at thefirst final memory cell in response to a load signal, and whereinreceiving the second transmittance value at the second final memory cellcomprises receiving the second transmittance value at the second finalmemory cell in response to the load signal.
 9. The method of claim 1,wherein after the first beamlet is illuminated on the target, the targetis moved to a predetermined position.
 10. A method for a MQW device thatis configured for use in a semiconductor patterning system that isintended to pattern a target, the MQW device including a first pixelthat has a first transmission element and a first support circuit and asecond pixel that has a second transmission element and a second supportcircuit the first support circuit having a first preliminary memorycell, a first load switch, and a first final memory cell, thesemiconductor patterning system including a memory bank configured tostore a first and a second transmittance values, a data line coupled tothe memory bank, and a source configured to transmit a beam of energytowards the MQW device, the method comprising: receiving, in the firstsupport circuit, the first transmittance value via the data line;storing the received first transmittance value in the first preliminarymemory cell; receiving, in the first final memory cell, the firsttransmittance value from the first preliminary memory cell through thefirst load switch; storing, in the first final memory cell, the firsttransmittance value received through the first load switch, atransmittance of the first transmission element depending on the firsttransmittance value stored in the first final memory cell; receiving, inthe second support circuit, the second transmittance value via the dataline; and storing, in the second support circuit, the received secondtransmittance value, a transmittance of the second transmission elementdepending on the second transmittance value stored in the second supportcircuit, in which the first and the second transmission elementsselectively permit to emerge, according to their transmittances,beamlets of the transmitted beam that reaches the MQW device, and thebeamlets emerging from the MQW device reach and pattern the target,wherein the target includes a semiconductor material.
 11. The method ofclaim 10, further comprising: then receiving, in the first preliminarymemory cell, via the data line a subsequent transmittance value; andstoring, in the first preliminary memory cell, the received subsequenttransmittance value concurrently with the first final memory cellstoring the first transmittance value.
 12. The method of claim 11,further comprising: then receiving and storing the subsequenttransmittance value in the first final memory cell.
 13. The method ofclaim 10, in which the first support circuit also has a firstpreliminary switch, and the first transmittance value is received viathe data line by the first preliminary memory cell through the firstpreliminary switch.
 14. The method of claim 13, in which the firsttransmittance value is received through the first preliminary switchresponsive to a column signal.
 15. The method of claim 10, in which thefirst preliminary memory cell stores a negative version of the firsttransmittance value.
 16. The method of claim 10, in which the firsttransmittance value is configured to be received through the first loadswitch responsive to a load signal.
 17. The method of claim 10, in whichthe first final memory cell stores a negative version of the firsttransmittance value.
 18. The method of claim 10, in which the secondsupport circuit has a second preliminary memory cell that stores thereceived second transmittance value, a second load switch, and a secondfinal memory cell, the second transmittance value is received in by thesecond final memory cell from the second preliminary memory cell throughthe second load switch, the received second transmittance value isstored in the second final memory cell.
 19. The method of claim 18, inwhich the first final memory cell receives the first transmittance valueresponsive to a load signal, and the second final memory cell receivesthe second transmittance value responsive to the load signal.
 20. Themethod of claim 10, wherein after the beamlets are illuminated on thetarget, the target is moved to a predetermined position.